At EQUA, we offer products with multilayer patterns formed by various metal films on glass substrates and silicon wafers. We propose the optimal process by leveraging advanced processing technologies, including our unique pattern data generation techniques, high-precision mask imaging equipment, semiconductor steppers, photo-etching, lift-off, plating, and sandblasting. We also enable ultra-high-precision processing by using photomask manufacturing equipment to directly pattern onto the substrate. We can form electronic circuits using various metal thin films, such as chrome, aluminum, titanium, and ITO, on substrates like glass, ceramics, and silicon.